Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source
作者： D. W. Hoffman , John A. Thornton
DOI: 10.1116/1.571463
关键词: Chemical vapor deposition 、 Microstructure 、 Cavity magnetron 、 Electrical resistivity and conductivity 、 Sputtering 、 Argon 、 Analytical chemistry 、 Composite material 、 Molybdenum 、 Materials science 、 Semiconductor
摘要: … Observations of the tensile-to-compressive stress transition using planar sputtering sources have been reported by other workers for de bias-sputtered Mo," and rfsputtered Ge (Ref. 11), …
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