System for maintaining uniform copper etching efficiency

作者: H. Ben Snyder

DOI:

关键词: StoichiometryFerricEtching (microfabrication)FerrousStandard solutionCopperReduction potentialChlorideMetallurgyInorganic chemistryChemistry

摘要: System and apparatus for the controlled etching of copper work pieces with ferric chloride etchants. The working solution is constantly monitored regard to its oxidation reduction potential (ORP) by comparison a standard or voltage. To reduce build up etched in solution, an ORP controller activates removal specific quantities that which are then replaced precise stoichiometric proportions fresh etchant. Simultaneously, oxidant injected into fluid reoxidize ferrous ions ions. control means repeats above procedure as often necessary maintain within acceptable range.