Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb

作者： Harold F. Winters

关键词: Copper 、 Chemistry 、 Analytical chemistry 、 Chemisorption 、 Etching (microfabrication) 、 Mass spectrometry 、 Chemical reaction 、 Reactive-ion etching 、 Plasma etching 、 Tungsten

摘要: A modulated‐beam, mass spectrometer system has been used to obtain information about etch products, reaction probabilities, and etching mechanisms for the reactions of Cl2 with Al(100) Cu(100) XeF2 W(111) Nb. The influence ion bombardment on also investigated.