Electromagnetic wave reflective film and method for producing same
作者： Shoji Takeshige , Satoru Hamada , Keiji Kashima
DOI:
关键词: Optoelectronics 、 Substrate (electronics) 、 Materials science 、 Layer (electronics) 、 Selective reflection 、 Electromagnetic radiation 、 Forming processes 、 Ultraviolet 、 Coating 、 Optics
摘要: Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using transparent substrate; applying coating solution on the substrate to form layer; irradiating with ultraviolet rays at dose in range 25 mJ/cm 2 800 ; and thereby second of: solution; so as be direct contact therewith rays; layer.
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