Ultrathin Porous Silicon Films
作者： Brahim Bessaı̈s
DOI:
关键词: Porous silicon 、 Surface finish 、 X-ray reflectivity 、 Reflectivity 、 Optoelectronics 、 Materials science 、 Porosity 、 Nanocrystalline silicon 、 Homogeneity (physics)
摘要: Investigations of the structure and morphology ultrathin PS films are reviewed, relevance to technological control ofminiaturized PS-based devices. Several characterization tools with high reliability precision available; however, many them destructive or could affect structure. Grazing incidence X-ray reflectivity (XRR) is a powerful tool probe structural morphological characteristics films. Homogeneity, thickness, surface interface roughness, porosity, density were accurately determined using XRR. Nonetheless, prior XRR measurements, should be submitted complementary nondestructive optical examinations (thickness, oxidation, etc.).
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