作者: L.S. Lichtmann , J.D. Parsons , E.-H. Cirlin
DOI: 10.1016/0022-0248(90)90719-2
关键词: Growth rate 、 Metalorganic vapour phase epitaxy 、 Temperature independent 、 Nanotechnology 、 Substrate (electronics) 、 Materials science 、 Volumetric flow rate 、 Molecule 、 Pyrolytic carbon 、 Cadmium telluride photovoltaics 、 Analytical chemistry
摘要: Abstract The molecule 2,5-dihydrotellurophene (DHTe) was identified, synthesized and tested to determine its potential as a Te source for unassisted pyrolytic MOCVD growth of Hg x Cd 1- at substrate temperatures ⋍ 300°C. Experiments were concentrated on CdTe using DHTe dimethylcadmium (DMCd) source. long-term stability far exceeded theoretical expectations. Cadmium telluride rates linear function the flow rate independent temperature or above 250°C. maximum measured, 4 μm/h, obtained by flowing 800 SCCM H 2 through sublimer (sublimer 10°C). All layers grown high-resistivity substrates p-type, with carrier concentrations between 6.2×10 15 4.2×10 16 cm -3 . best electrical properties 250°C, where p-type concentration Hall mobility 80 /V·s.