作者: Tzvetomir Tzvetanov , Andrea Wirmer , Kristian Folta
DOI: 10.1016/J.VISRES.2007.03.003
关键词: Stimulus (physiology) 、 Grating 、 Vernier scale 、 Artificial intelligence 、 Psychology 、 Psychophysics 、 Social psychology 、 Single line 、 Attraction 、 Perception 、 Pattern recognition
摘要: Orientation masking induces changes of discrimination thresholds and perceived orientation. Studies on alignment Vernier stimuli concentrated induced thresholds, without considering possible orientation and/or the two-line segments. Measuring both parameters in an task, we confirmed a standard repulsion effect between single line target mask grating that co-varied with elevated thresholds. Masking stimulus observed strong misperception was accompanied revealed attraction depended spatio-orientation configuration superimposed stimuli. Control task-dependent effects our pattern results independent attentional or cognitive demands.