Orientation repulsion and attraction in alignment perception.

作者: Tzvetomir Tzvetanov , Andrea Wirmer , Kristian Folta

DOI: 10.1016/J.VISRES.2007.03.003

关键词: Stimulus (physiology)GratingVernier scaleArtificial intelligencePsychologyPsychophysicsSocial psychologySingle lineAttractionPerceptionPattern recognition

摘要: Orientation masking induces changes of discrimination thresholds and perceived orientation. Studies on alignment Vernier stimuli concentrated induced thresholds, without considering possible orientation and/or the two-line segments. Measuring both parameters in an task, we confirmed a standard repulsion effect between single line target mask grating that co-varied with elevated thresholds. Masking stimulus observed strong misperception was accompanied revealed attraction depended spatio-orientation configuration superimposed stimuli. Control task-dependent effects our pattern results independent attentional or cognitive demands.

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