Simultaneous Thickness Measurement and Material Composition Analysis Using X-Ray Fluorescence Technique
作者： Hsiao-Wen Wu , Xuan-Loc Nguyen
DOI: 10.1007/978-1-4614-6747-2_101
关键词: Function (mathematics) 、 Materials science 、 Spectral line 、 Radiation 、 Fluorescence 、 Monochromatic color 、 Composition analysis 、 X-ray fluorescence 、 Optics
摘要: In this chapter, a methodology for simultaneous thickness measurement and material composition analysis using X-ray fluorescence (XRF) technique is present. This research bases on the fundamental parameter (FP) method to reconstruct of target layers. A monochromatic non-divergent incident radiation used as source generating emission characteristic secondary spectrum from material. The reference set in which known was calibrate validate concentrations elements. XRF measurements are correlated function process parameters given by receiving spectra inspecting target. can provide real-time with high accuracy determining composition.
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