作者: J Robertson
DOI: 10.1088/0022-3719/18/4/023
关键词: Crystallography 、 Extended X-ray absorption fine structure 、 Materials science 、 Monolayer 、 Transition metal 、 Nickel 、 Electronic structure 、 Silicide
摘要: The electronic structure of Ni overlayers on Si (111) has been calculated by the tight-binding method for various possible bonding geometries. Surface EXAFS suggests nickel exists at six- or sevenfold-coordinated, Ni6 Ni7, sites buried between topmost layers Si. authors results favour geometry which EF lies in lower gap, as observed, while Ni7 configuration appears to be less stable. A general model other transition-metal is developed. Co5 CoSi2:Si(111) interfaces rationalised and an interstitial threefold coordination suggested Co monolayers account photoemission data.