Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
作者： Shankar Kumar Selvaraja , Peter De Heyn , Gustaf Winroth , Patrick Ong , Guy Lepage
关键词: Optoelectronics 、 Immersion lithography 、 Optics 、 Silicon photonics 、 Wavelength-division multiplexing 、 Communication channel 、 CMOS 、 Materials science
摘要: Using an advanced 300mm CMOS-platform, we report record-low and highly-uniform propagation loss: 0.45±0.12dB/cm for wires, 2dB/cm slot waveguides. For WDM devices, demonstrate channel variation(3-σ) within-wafer within-device of 6.1nm 1.2nm respectively.
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