E-beam lithography and electrodeposition fabrication of thick nanostructured devices
作者： T N Lo , Y T Chen , C W Chiu , C J Liu , S R Wu
DOI: 10.1088/0022-3727/40/10/021
关键词: X-ray lithography 、 Next-generation lithography 、 Nanotechnology 、 Resist 、 Extreme ultraviolet lithography 、 Materials science 、 Lithography 、 Photolithography 、 Electron-beam lithography 、 Nanolithography
摘要: A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, x-ray masks other devices.
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