Atomic Layer Deposition of Zn(O,S) Alloys Using Diethylzinc with H2O and H2S: Effect of Exchange Reactions

作者: Diane K. Lancaster , Huaxing Sun , Steven M. George

DOI: 10.1021/ACS.JPCC.7B05361

关键词: Valence bandThin filmSulfur contentNanotechnologyAtomic layer depositionReaction conditionsAnalytical chemistryBand gapDiethylzincThermal conductionMaterials science

摘要: Zn(O,S) thin films have a tunable band gap and are useful as conduction valence buffers in various types of solar cells. Previous growth by atomic layer deposition (ALD) has utilized alternating cycles ZnO ALD ZnS ALD. Controlling the composition alloys using is complicated because an efficient exchange reaction between gaseous H2S given ZnOH* + → ZnSH* H2O. This facile leads to higher than expected sulfur content films. In this study, effect on was examined varying conditions. For cycles, film strongly affected temperature size exposure. An alternative method that avoids also employed grow uses codosing H2O at 100 °C. Codo...

参考文章(54)
V Khomyak, I Shtepliuk, Volodymyr Khranovskyy, Rositsa Yakimova, None, Band-gap engineering of ZnO1−xSx films grown by rf magnetron sputtering of ZnS target Vacuum. ,vol. 121, pp. 120- 124 ,(2015) , 10.1016/J.VACUUM.2015.08.008
C-H Chang, Y-K Chiou, Y-C Chang, K-Y Lee, T-D Lin, T-B Wu, M Hong, J Kwo, None, Interfacial self-cleaning in atomic layer deposition of HfO2 gate dielectric on In0.15Ga0.85As Applied Physics Letters. ,vol. 89, pp. 242911- ,(2006) , 10.1063/1.2405387
A. Hultqvist, C. Platzer-Björkman, E. Coronel, M. Edoff, Experimental investigation of Cu(In1−x,Gax)Se2/Zn(O1−z,Sz) solar cell performance Solar Energy Materials and Solar Cells. ,vol. 95, pp. 497- 503 ,(2011) , 10.1016/J.SOLMAT.2010.09.009
Jukka T. Tanskanen, Jonathan R. Bakke, Tapani A. Pakkanen, Stacey F. Bent, Influence of organozinc ligand design on growth and material properties of ZnS and ZnO deposited by atomic layer deposition Journal of Vacuum Science and Technology. ,vol. 29, pp. 031507- ,(2011) , 10.1116/1.3572232
J. D. Ferguson, A. W. Weimer, S. M. George, Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles Journal of Vacuum Science and Technology. ,vol. 23, pp. 118- 125 ,(2005) , 10.1116/1.1821585
Shannon C. Riha, Joseph A. Libera, Jeffrey W. Elam, Alex B. F. Martinson, Design and implementation of an integral wall-mounted quartz crystal microbalance for atomic layer deposition. Review of Scientific Instruments. ,vol. 83, pp. 094101- ,(2012) , 10.1063/1.4753935
Ivan I. Novochinskii, Chunshan Song, Xiaoliang Ma, Xinsheng Liu, Lawrence Shore, Jordan Lampert, Robert J. Farrauto, Low-Temperature H2S Removal from Steam-Containing Gas Mixtures with ZnO for Fuel Cell Application. 1. ZnO Particles and Extrudates Energy & Fuels. ,vol. 18, pp. 576- 583 ,(2004) , 10.1021/EF030137L
Shiv K Pandey, Shipra Pandey, Vyom Parashar, Raghvendra S Yadav, GK Mehrotra, Avinash C Pandey, None, Bandgap engineering of colloidal zinc oxysulfide via lattice substitution with sulfur Nanoscale. ,vol. 6, pp. 1602- 1606 ,(2014) , 10.1039/C3NR04457B
Clas Persson, Charlotte Platzer-Björkman, Jonas Malmström, Tobias Törndahl, Marika Edoff, Strong valence-band offset bowing of ZnO1-xSx enhances p-type nitrogen doping of ZnO-like alloys. Physical Review Letters. ,vol. 97, pp. 146403- ,(2006) , 10.1103/PHYSREVLETT.97.146403
J. W. Elam, M. D. Groner, S. M. George, Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition Review of Scientific Instruments. ,vol. 73, pp. 2981- 2987 ,(2002) , 10.1063/1.1490410