Characterization of cascade arc assisted CVD diamond-coating technology: Part II. Coating properties and applications
作者： Vladimir I. Gorokhovsky
DOI: 10.1016/J.SURFCOAT.2004.08.209
关键词: Analytical chemistry 、 Materials science 、 Chemical vapor deposition 、 Diamond 、 Plasma parameters 、 Raman spectroscopy 、 Composite material 、 Microscopy 、 Substrate (printing) 、 Carbide 、 Coating 、 Materials Chemistry 、 General chemistry 、 Surfaces, Coatings and Films 、 Surfaces and Interfaces 、 Condensed matter physics
摘要: The cascade arc assisted chemical vapor deposition (CACVD) reactor is capable of producing high-quality diamond coatings to accommodate high-volume production. This has demonstrated the ability deposit polycrystalline with high uniformity and industrial-scale productivity. Precise control plasma parameters as well thermal management substrates allows for optimization coating on different materials having various geometries. Approximately 1000 cylindrical 2 mm diameter×20 long can be mounted coated simultaneously in industrial tubular CACVD 1-m-long reaction zone. properties were studied by electron microscopy Raman spectroscopy. influence predeposition treatments was investigated. A comparison characteristics films deposited carbide, Mo, W stainless steel also presented. correlation between morphology CVD vs. substrate material its position chamber assessed using micro-Raman spectroscopy secondary microscopy. There no indication suggest relationship properties.
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