Method and system for controlling narrow-band oscillation excimer laser

摘要: A method for controlling a narrow-band oscillation excimer laser which is suitable control of an used as light source reduced projection exposer, and system thereof. At least two wavelength selective element are disposed within oscillator. There provided center causing determined by these elements to coincide with desired value, overlapping the transmission wavelengths elements, power voltage applied electrodes located chamber thereby output. Partial gas replacement carried out when application becomes high. After execution partial replacement, such that period set be substantially equal or inhibitd during control. time activating laser, first then out.