作者: A. Hellmich , T. Jung , A. Kielhorn , M. Rißland
DOI: 10.1016/S0257-8972(97)00299-5
关键词: Deposition (phase transition) 、 Analytical chemistry 、 Materials science 、 Plasma-enhanced chemical vapor deposition 、 Plasma 、 Glow discharge 、 Thin film 、 Amorphous carbon 、 Cathode 、 Chemical vapor deposition
摘要: … we found a correlation between the adherence and the oxygen concentration in the metal layer. Using appropriate deposition conditions. the oxygen content in the films was below 0.2 at…