CVD-processes by hollow cathode glow discharge

作者: A. Hellmich , T. Jung , A. Kielhorn , M. Rißland

DOI: 10.1016/S0257-8972(97)00299-5

关键词: Deposition (phase transition)Analytical chemistryMaterials sciencePlasma-enhanced chemical vapor depositionPlasmaGlow dischargeThin filmAmorphous carbonCathodeChemical vapor deposition

摘要: … we found a correlation between the adherence and the oxygen concentration in the metal layer. Using appropriate deposition conditions. the oxygen content in the films was below 0.2 at…

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