作者: J. Zalesak , D. Holec , I. Matko , M. Petrenec , B. Sartory
DOI: 10.1016/J.ACTAMAT.2017.04.009
关键词: Lattice constant 、 Electron energy loss spectroscopy 、 Grain boundary 、 Tin 、 Epitaxy 、 Crystallography 、 Microstructure 、 Materials science 、 Thin film 、 Chemical vapor deposition
摘要: Abstract Synthesis of self-assembled thin films with multi-layered microstructures and outstanding functional properties represents a challenging task. In this work, detailed microstructural chemical analyses ∼3.8 μm thick cubic (c) (Al x Ti 1- ) y N film grown by low pressure vapour deposition on Al 2 O 3 (0001) substrate is discussed. The an overall fraction ∼0.8 consists alternating non-stoichiometric Al-rich Ti-rich nanolamellae thicknesses ∼11 ∼1.5 nm. X-ray diffraction, electron microscopy energy loss spectroscopy indicate that the coherency primarily result deficiency in excess nanolamellae, which induce decrease increase lattice parameters, compared to parameters stoichiometric rock-salt c-TiN c-AlN, respectively. Therefore self-assembly allows formation c-(Al atomic 0.9–1.0, are stabilized neighbouring as cube-on-cube epitaxy. effect parameter self-adjustment coherent element verified ab initio calculations. compositional morphological matches interfaces at grain boundaries, terraced growth tetrahedral surface morphology unzipped facets well uniform thickness across depth formed kinetically-controlled oscillating reactions during growth. understanding fascinating nanolamellar microstructure containing meta-stable c-AlN , does not exist bulk form ambient conditions, milestone technology.