Surface concentration changes in Cu-Zn alloys under ion bombardment
作者： J. Ferron , L.S. De Bernardez , E.C. Goldberg , R.H. Buitrago
DOI: 10.1016/0378-5963(83)90037-5
关键词: Steady state (chemistry) 、 Ion bombardment 、 Sputtering 、 Ion beam deposition 、 Analytical chemistry 、 Chemistry 、 Auger electron spectroscopy 、 Ion 、 Ion beam mixing 、 Alloy
摘要: Abstract We have measured the depth profile of a Cu-48.2at%Zn alloy by means Auger Electron Spectroscopy combined with Ar + ion bombardment. also steady state surface concentration for different energies, and transient variation when energies were changed from 0.5 to 5 keV vice versa. found that effect altered layer thickness electron escape can produce an incorrect measurement preferential sputtering energy dependence. presence strong shadow AES variations along profile.
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