Solid-state imaging element and manufacturing method thereof, and electronic information device
作者： Hiroshi Iwata
DOI:
关键词: Signal 、 Optics 、 Sensitivity (electronics) 、 Intensity (heat transfer) 、 Photodiode 、 Electrode 、 Materials science 、 Semiconductor 、 Optoelectronics 、 Color gel 、 Pixel
摘要: A color filter is formed using a simple manufacturing method, and bias application to pixel separating electrode allows sensitivity in low illumination intensity be improved. In solid-state imaging element, which plurality of unit sections are disposed two dimensionally on side closer front surface semiconductor substrate or layer, each section having light receiving for generating signal charge by irradiation, an adjoining the same allow lesser alignment accuracy filter. section, shared during intensity, thereby improving effective photodiode area.
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