Method for the production of an optical phase-shifting board

作者: Mototaka Taneya , Mitsuhiro Matsumoto , Sadayoshi Matsui

DOI:

关键词: SemiconductorEtching rateLaserMaterials scienceThermosetting polymerElectronic engineeringOptoelectronics

摘要: A method for the production of an optical phase-shifting board comprising laying two or more layer-elements with different etching rates therebetween upon a substrate and then subjecting to treatment so as remove given portions layer-element highest rate that is disposed on top layer-elements, resulting in board, fixation stem disposing molten light-sensitive thermosetting resin guiding rail positioned front light-emitting face semiconductor laser device, placing stem, sliding along while far-field pattern device being monitored, stopping at position where conforms desired pattern, curing fix said position.

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Lawrence David Jackel, Jonathan Curtis White, Harold Gene Craighead, Richard Edwin Howard, Mask structure for vacuum ultraviolet lithography ,(1984)