A new approach to molecular devices using SAMs, LSMCD and Cat-CVD

作者: T. Nishikawa , T. Mitani

DOI: 10.1016/S1468-6996(03)00013-5

关键词: Combustion chemical vapor depositionFabricationCatalytic chemical vapor depositionChemical depositionLangmuir–Blodgett filmMaterials scienceThin filmNanotechnologyChemical vapor depositionOxygen

摘要: This paper proposes a new technology for the fabrication of molecular devices using nanotechnology based on liquid and surface sciences recently developed, such as direct patterning solid surfaces difference hydrophobic hydrophilic properties self-assembled mono-layers self-assembly films metal nanoparticles, fine by method Liquid Source Misted Chemical Deposition, Langmuir–Blodgett films. In these liquid-based technologies, various kinds organic compounds in solutions, including biological systems, can be used functional materials devices. addition, it has been found that insulating inorganic obtained catalytic chemical vapor deposition are quite effective protection against water and/or oxygen. We confirm, from experimental results presented this report, approach is practically promising future.

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