Microstructuring of graphene oxide nanosheets using direct laser writing.

摘要: Graphene(G),a single atomiclayer ofaromatic carbon atoms,has attracted much attention recently owing to its fascinating properties such as massless fermions, ballistic electronic transport, and ultrahigh electron mobility. [1] Currently, there are many approaches the synthesis of graphene ranging from chemical vapor deposition hydrocarbon solution phase methods involving exfoliation graphite. [2] One commonly used solution-processing route involved reduction oxide (GO). GO is produced by oxidative treatment The basal planes decorated with epoxide hydroxyl groups, while carboxylic carbonyl groups located at edges. These oxygen functionalities render hydrophilic improve solubility, however they destroy aromaticity framework. As a result, insulating, thermal annealing needed before conductivity could be recovered. presence functional also reduces stability relative that G, since can thermally pyrolized high temperatures transformed into volatile carbonaceous oxides. instability motivates us consider strategy for microstructuing nanosheets using laser-assisted etching. microstructuring relevant challenges lithographically patterning G interconvertible some extent. Recently, promising patterned assemblies on substrates have been developed. [3–8] Micro-contact printing molecular templates was transfer sheets onto pre-defined areas substrate surfaces via electrostatic attachment. [3] Large-scale films were synthesized nickel layers deposition. [7] All reported so far conventional lithographic techniques or employment masks definition patterns substrates. To date, few demonstrations maskless, direct ‘‘writing’’ pattern G-related materials beam optical methods.