Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates
作者： Nicole Herzer , Stephanie Hoeppener , Ulrich S. Schubert
DOI: 10.1039/C0CC00674B
关键词: Resist 、 Surface modification 、 Materials science 、 Self-assembled monolayer 、 Lithography 、 Photolithography 、 Substrate (printing) 、 Nanotechnology 、 Fabrication 、 Silane
摘要: … highlight developments of photolithographic techniques that … to be summarized in this review. They will be introduced here … the combination of photolithographic structuring approaches, …
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