Method and apparatus for smoothing surfaces on an atomic scale

作者: Jacques C. S. Kools , Adrian J. Devasahayam

DOI:

关键词: SmoothingAnalytical chemistryChemistryIon sourceAtomic unitsIonNoble gasRemote plasmaSputteringEtching (microfabrication)Optics

摘要: A method and an apparatus for smoothing surfaces on atomic scale. The invention performs of by use a low energy ion or neutral noble gas beam, which may be formed in source remote plasma source. process comprise post-deposition step (e.g., assist step) multilayer fabrication procedure. utilizes combinations relatively particle below the sputter threshold material) near normal incidence angles, achieve improved surface scale with substantially no etching surface.

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