作者: Jacques C. S. Kools , Adrian J. Devasahayam
DOI:
关键词: Smoothing 、 Analytical chemistry 、 Chemistry 、 Ion source 、 Atomic units 、 Ion 、 Noble gas 、 Remote plasma 、 Sputtering 、 Etching (microfabrication) 、 Optics
摘要: A method and an apparatus for smoothing surfaces on atomic scale. The invention performs of by use a low energy ion or neutral noble gas beam, which may be formed in source remote plasma source. process comprise post-deposition step (e.g., assist step) multilayer fabrication procedure. utilizes combinations relatively particle below the sputter threshold material) near normal incidence angles, achieve improved surface scale with substantially no etching surface.