Systems control for a micro-stereolithography prototype

摘要: Abstract The system control of a micro-stereolithographic fabrication is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. application National Instrument LabVEIW© environment demonstrated provide good basis for rapid development necessary structures. In particular, this provides highly flexible system, typical activities which include: low-level interface formats; icon-based systems design; support human–computer interfacing. resulting has capability two orders magnitude improvement above that currently available.