Tft substrates and the manufacturing methods thereof

作者: Shimin Ge

DOI:

关键词: Manufacturing efficiencyOptoelectronicsMaterials scienceThin-film transistorManufacturing methodsElectrodeMasking (art)Substrate (printing)Electrical engineeringLayer (electronics)Oxide

摘要: The TFT array substrate and the manufacturing method thereof are disclosed. dual-layer structure having bottom gate electrode, including metal layer transparent oxide layer, common may be formed by same masking process. In this way, number of processes decreased so as to enhance efficiency cost.

参考文章(16)
Katsufumi Tomihisa, Toshihiro Kugimiya, Hiroshi Gotoh, Display device and sputtering target for producing the same ,(2006)
Robert Satorius, Mark Thompson, Michael McGeady, Opening guard mechanism for printed product stacking device ,(2000)
Robert Flatt, Pascal Bailleul, Christophe Guyot, Activator composition for latent hydraulic and/or pozzolanic binder materials ,(2012)
Youngsuk Song, Seongyeol Yoo, Seungjin Choi, Method for fabricating array substrate, array substrate and display device ,(2015)
Yoon-Ho Khang, Dong-Hwan Shim, Se-Hwan Yu, Su-Hyoung Kang, Sang-Ho Park, Yong-Su Lee, Min-Jung Lee, Thin film transistor substrate and method of manufacturing the same ,(2013)
Nak-Cho Choi, Young-Joon Rhee, Yoon-Sung Um, Myung-Jae Park, Jeong-Ho Lee, Jae-jin Lyu, Jang-kun Song, Liquid crystal display and thin film transistor array panel ,(2002)