作者: Michihiko Kitao , Kuniyuki Izawa , Kazuo Urabe , Takeshi Komatsu , Saburou Kuwano
DOI: 10.1143/JJAP.33.6656
关键词: X-ray photoelectron spectroscopy 、 Nickel oxide 、 Analytical chemistry 、 Infrared spectroscopy 、 Sputtering 、 Electrochromism 、 Absorption spectroscopy 、 Thin film 、 Optics 、 Chemistry 、 Non-blocking I/O
摘要: The preparation of electrochromic nickel oxide (NiO x) films, which are colorless in an as-deposited state, has been carried out in Ar/O 2/H 2 mixed gas by the rf-sputtering method. …