作者: A.C. Hoogerwerf , C. Hinderling , S. Krishnamoorthy , C. Hibert , V. Spassov
DOI: 10.1109/SENSOR.2007.4300174
关键词: Deep reactive-ion etching 、 Membrane 、 Silicon nitride 、 Fabrication 、 Materials science 、 Surface micromachining 、 Microelectromechanical systems 、 Etching (microfabrication) 、 Silicon 、 Nanotechnology
摘要: A fabrication technology to create reinforced nanoporous membranes of 60 nm thick is described. The uses a variety micromachining processes form membrane. Block copolymer micelle formation used define the pores 20 30 in diameter that are subsequently etched membrane using Deep Reactive Ion Etching (DRIE). made silicon nitride polysilicon sandwich allows post-etching reduction pore size though oxidation polysilicon.