作者: Roberto Vidal , Alan C. West
DOI: 10.1149/1.2050074
关键词: Phosphoric acid 、 Copper 、 Reaction rate 、 Rotating disk electrode 、 Electropolishing 、 Chemistry 、 Acceptor 、 Diffusion 、 Limiting current 、 Analytical chemistry
摘要: The electropolishing of rotating copper‐disk electrodes in concentrated phosphoric acid is studied by steady‐state measurements, ac‐impedance spectroscopy, and flow‐modulation spectroscopy. effects applied potential, rotation speed, temperature on the response system are investigated at mass‐transfer‐limited plateau. Both Arrhenius behavior limiting current data suggest that rate reaction controlled mass transfer an acceptor to copper surface not precipitation a salt film. It possible determine from measurements diffusion coefficient because its identity bulk concentration known with certainty. Therefore, complemented spectra which allow estimation without knowledge concentration.