Copper Electropolishing in Concentrated Phosphoric Acid I . Experimental Findings

作者: Roberto Vidal , Alan C. West

DOI: 10.1149/1.2050074

关键词: Phosphoric acidCopperReaction rateRotating disk electrodeElectropolishingChemistryAcceptorDiffusionLimiting currentAnalytical chemistry

摘要: The electropolishing of rotating copper‐disk electrodes in concentrated phosphoric acid is studied by steady‐state measurements, ac‐impedance spectroscopy, and flow‐modulation spectroscopy. effects applied potential, rotation speed, temperature on the response system are investigated at mass‐transfer‐limited plateau. Both Arrhenius behavior limiting current data suggest that rate reaction controlled mass transfer an acceptor to copper surface not precipitation a salt film. It possible determine from measurements diffusion coefficient because its identity bulk concentration known with certainty. Therefore, complemented spectra which allow estimation without knowledge concentration.

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