作者: Jung Woo Leem , Bhaskar Dudem , Jae Su Yu
DOI: 10.1039/C7RA06444F
关键词: Silicon 、 Optics 、 Etching (microfabrication) 、 Anti-reflective coating 、 Inductively coupled plasma 、 Optoelectronics 、 Absorption (electromagnetic radiation) 、 Nano- 、 Contact angle 、 Wetting 、 Materials science
摘要: We report the fabrication of nano/micro double-textured silicon (NMDT-Si) and its structural, optical, surface wetting properties. The micro-pyramidal textured (MPTs) are formed on Si by a simple potassium hydroxide-based wet etching process. On other hand, for pillar-arrayed nano-textures (NTs), thermally-dewetted gold (Au) nanoparticles employed MPT-Si as an etch mask inductively coupled plasma is followed. optical reflectance NMDT-Si strongly dependent period height NTs MPT-Si, which can be controlled Au film thickness time, respectively. Compared with planar nano-textured Si, shows superior antireflection (or higher light absorption) light-scattered propagation behaviors, verified from finite-difference time-domain simulation, over wide ranges wavelengths (350–1100 nm) incident angles (0–70°), resulting in average ∼2.1% solar weighted absorption ∼98.5% at normal incidence, In addition, it has super-hydrophilic water contact <5°.