Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry
作者： Xi-du Nie , Yi-zeng Liang , You-gen Tang , Hua-lin Xie
DOI: 10.1007/S11771-012-1290-0
关键词: Trace element 、 Microwave digestion 、 Relative standard deviation 、 Analytical chemistry 、 Trace (linear algebra) 、 Detection limit 、 Inductively coupled plasma mass spectrometry 、 Chemistry 、 Nickel 、 High resolution
摘要: The contents of Mg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). sample was dissolved HNO3 HCl microwave digestion. Most the spectral interferences could be avoided measuring mode. matrix effects because presence excess evaluated. Correction for made using Sc, Rh Tl as internal standards. optimum conditions determination tested discussed. detection limits range from 0.012 to 1.76 μg/g depending on type elements. applicability proposed method is also validated analysis reference material (NIST SRM 671). relative standard deviation (RSD) less than 3.3%. Results trace elements presented.
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