Silicon etching process for making microchannel plates

摘要: An element with elongated, high aspect ratio channels (30) such as microchannel plate is fabricated by electrochemical etching of a p-type silicon (10) in electrolyte (26) to form extending through the element. The may be an aqueous electrolyte. For use plate, surfaces can converted insulating dioxide (28), and dynode material (32) electron emissivity deposited onto channels. New materials are also disclosed.