Power matching to pulsed inductively coupled plasmas

摘要: Matching of power delivery to nonlinear loads in plasma processing is a continuing challenge. Plasma reactors used microelectronics fabrication are increasingly multi-frequency and/or pulsed, producing non-linear and, many cases, non-steady state electrical termination that can complicate efficient coupling the plasma. This particularly case for pulsed inductively coupled plasmas where impedance significantly change during start-up-transient and undergo an E–H (capacitive-to-inductive) transition. In this paper, we discuss results from computational investigation dynamics matching (Ar/Cl2 mixtures tens mTorr pressure) using fixed component networks their consequences on properties. investigation, set-point components network provide best-case match (relative characteristic supply) at chosen time cycle. early pulse enables feed E-mode, thereby emphasizing capacitive large excursions potential. more rapid ramp-up density while being mismatched H-mode later pulse. The also produces energetic ion bombardment surfaces. late diminishes dissipated E-mode cost reducing rate increase density.