Thermodynamic modeling of the Hf–Si–O system
作者： Dongwon Shin , Raymundo Arróyave , Zi-Kui Liu
DOI: 10.1016/J.CALPHAD.2006.08.006
关键词: Ternary compound 、 CALPHAD 、 Degrees of freedom (physics and chemistry) 、 Physical chemistry 、 Mixing (physics) 、 Phase diagram 、 Thin film 、 Silicon 、 Chemistry 、 Thermodynamics 、 Hafnium
摘要: … The Hf–O system was combined with previously modeled Hf–Si and Si–O systems, and the ternary compound in the Hf–Si–O system, HfSiO 4 has been introduced to calculate the …
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