作者: S K H Lam , Wenrong Yang , H T R Wiogo , C P Foley
DOI: 10.1088/0957-4484/19/28/285303
关键词: Resist 、 Nanoparticle 、 Inductive coupling 、 Nanotechnology 、 Electron-beam lithography 、 Monolayer 、 SQUID 、 Overlayer 、 Magnetic nanoparticles 、 Materials science 、 Mechanical engineering 、 Electrical and Electronic Engineering 、 General Materials Science 、 Mechanics of Materials 、 Bioengineering 、 General chemistry
摘要: A novel procedure combining monolayer self-assembly with electron beam lithography has been developed for attaching ferritin nanoparticles to a submicron thin-film SQUID (superconducting quantum interference device). After opening window in the PMMA (polymethylmethacrylate) resist, organic linker molecules are used attach exposed parts of gold overlayer Nb nanoSQUID. This allows magnetic be located optimally as far coupling nanoSQUID is concerned.