作者: Katsumi Nagano , Yasuo Shiinoki , Hiroo Goshi , Michio Sato , Shigeharu Hamada
DOI:
关键词: Current density 、 Current (fluid) 、 Plating 、 Optoelectronics 、 Mineralogy 、 Materials science
摘要: An apparatus for automatically maintaining plating current density within a predetermined range while controlling to produce desired thickness includes means energizing only the number of cells required maintain range. The total is distributed among energized cells. Decreases in made at speed values which are less by hysteresis value than speeds increased avoid instability due normal reading variations.