Plating current automatic compensating apparatus

作者: Katsumi Nagano , Yasuo Shiinoki , Hiroo Goshi , Michio Sato , Shigeharu Hamada

DOI:

关键词: Current densityCurrent (fluid)PlatingOptoelectronicsMineralogyMaterials science

摘要: An apparatus for automatically maintaining plating current density within a predetermined range while controlling to produce desired thickness includes means energizing only the number of cells required maintain range. The total is distributed among energized cells. Decreases in made at speed values which are less by hysteresis value than speeds increased avoid instability due normal reading variations.

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