Off-axis levelling in lithographic projection apparatus
作者： Richard J. H. Du Croo de Jongh , Jacob F. F. Klinkhamer , Theodorus M. Modderman , Gerrit J. Nijmeijer , Marcus E. J. Boonman
DOI:
关键词: Reference surface 、 Optics 、 Focus (optics) 、 Projection (mathematics) 、 Cardinal point 、 Geology 、 Tilt (optics) 、 Surface (mathematics) 、 Levelling 、 Substrate (printing)
摘要: In an off-axis levelling procedure a height map of the substrate is generated at measurement station. The referenced to physical reference surface table. may be in which inset transmission image sensor. At exposure station measured and related focal plane projection lens. can then used determine optimum and/or tilt table position area on best focus during exposure. same principles applied (reflective) masks.
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