Multiple level photolithography
作者： John Perring , John Shannon , Brian Martin
DOI:
关键词: Photolithography 、 Substrate (printing) 、 Optoelectronics 、 Nanotechnology 、 Geography 、 Photoresist
摘要: A method is provided for performing photolithography on a substrate which has first region lower level and second an upper level, wherein pattern area exists within said region, at least regions are coated with photoresist, the comprising: a) exposing photoresist through mask so as to expose including area, thus create in but not area; b) also of lies adjacent region.
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