A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation
作者： L. F. Lin , C. Y. Chao , D. D. Macdonald
DOI: 10.1149/1.2127592
关键词: Metallurgy 、 Nickel 、 Chemical engineering 、 Halide 、 Anode 、 Growth kinetics 、 Aqueous solution 、 Chemical breakdown 、 Overpotential 、 Materials science
摘要: The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended account for chemical breakdown. This provides quantitative explanations dependence breakdown potential on halide concentration, and incubation time‐breakdown overpotential relationships have observed iron nickel in aqueous solutions. Limitations are identified discussed.
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