作者: B. Sieczkowska , M. Millaruelo , B. Voit
DOI: 10.1163/156855505774597786
关键词: Dithiol 、 Polymer chemistry 、 Copolymer 、 Polymer 、 Methacrylamide 、 Methacrylate 、 Covalent bond 、 Chemistry 、 Methyl methacrylate 、 Radical polymerization
摘要: We present the synthesis and characterization of a family photolabile co- terpolymers (acrylate/methacrylate type) suitable for nanotechnology applications. They have been obtained by free radical polymerization corresponding monomers: photosensitive component (nitroveratryl methacrylamide type), which allows release amino functionalities after irradiation with UV light, dithiol derivative that enables covalent attachment these materials onto gold substrates, methyl methacrylate or styrene acting as spacer between both functional units, promoting formation films good quality. The polymers characterized using techniques NMR, FTIR, GPC, TGA, DSC spectroscopy. deprotection function in has proven.