Light-sensitive composition
作者： Kouichi C , Noriaki C , O Fuji Photo Film Co. Ltd. Imai , Masanori C , O Fuji Photo Film Co. Ltd. Kawamura
DOI:
关键词: Aqueous solution 、 Polyurethane 、 Photomask 、 Chemical engineering 、 Coating 、 Nanotechnology 、 Substrate (printing) 、 Chemistry 、 Lithography 、 Composition (visual arts) 、 Durability
摘要: A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The is excellent in developing properties an alkaline developer coating properties. In addition, the images obtained from are good wear resistance exhibit high adhesion to substrate. Thus, very suitable for use making IC circuits, photomasks PS plates which provide lithographic printing exhibiting durability.
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