Chemical Vapor Deposition in Manufacturing
作者： Leszek A. Dobrzański , Klaudiusz Gołombek , Krzysztof Lukaszkowicz
DOI: 10.1007/978-1-4471-4976-7_29-1
关键词: Physical vapor deposition 、 Chemical vapor deposition 、 Plasma processing 、 Chemical engineering 、 Combustion chemical vapor deposition 、 Materials science
摘要:
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sci-hub.st 参考文章(93)
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