Residue Detection with Spectrographic Sensor

作者: Jeffrey Drue David , Wen-Chiang Tu , Boguslaw A. Swedek

DOI:

关键词: ChemistryOpticsOptical metrologySpectral lineScalar ValueRelative motionResidue (complex analysis)

摘要: Detecting residue of a filler material over patterned underlying layer includes causing relative motion between probe an optical metrology system and substrate, obtaining plurality measured spectra with the through from different measurement spots within area on comparing each to reference spectrum generate similarity values, being reflected material, combining values scalar value, determining presence based value.

参考文章(14)
Jeffrey Drue David, Jun Qian, Jimin Zhang, Harry Q. Lee, Automatic initiation of reference spectra library generation for optical monitoring ,(2011)
Yu-Sin Yang, Woo-Seok Ko, Hyung-su Son, Chung-sam Jun, Method for inspection of defects on a substrate ,(2010)
Dominic J. Benvegnu, David J. Lischka, Boguslaw A. Swedek, Spectrum based endpointing for chemical mechanical polishing ,(2005)
Dominic J. Benvegnu, Lakshmanan Karuppiah, Jeffrey Drue David, Boguslaw A. Swedek, Harry Q. Lee, Substrate thickness measuring during polishing ,(2008)