作者: Jeffrey Drue David , Wen-Chiang Tu , Boguslaw A. Swedek
DOI:
关键词: Chemistry 、 Optics 、 Optical metrology 、 Spectral line 、 Scalar Value 、 Relative motion 、 Residue (complex analysis)
摘要: Detecting residue of a filler material over patterned underlying layer includes causing relative motion between probe an optical metrology system and substrate, obtaining plurality measured spectra with the through from different measurement spots within area on comparing each to reference spectrum generate similarity values, being reflected material, combining values scalar value, determining presence based value.