X-ray topographic study of β-NiAl upon growth of an α-Al 2 O 3 film

作者: T. Homma , H. M. Hindam , Y. Pyun , W. W. Smeltzert

DOI: 10.1007/BF00738384

关键词: CrystallographyDiffractionMaterials scienceMetalOxideMetallic materialsX-raySubstructureNial

摘要: The Berg-Barrett X-ray topographic method was employed as a microstructural technique to seek correlations of the metal substructure morphological features α-Al2O3 films grown on β-NiAl. An analysis diffraction micrographs using {112} and {002} reflections from individual grains in β-NiAl revealed its subgrain structure depth 30 μ. dimensions these subgrains were directly related density oxide ridges shapes cavities at NiAl-Al2O3 interface.

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