Paralinear Oxidation of Silicon Nitride in a Water‐Vapor/Oxygen Environment
作者： Dennis S. Fox , Elizabeth J. Opila , QuynhGiao N. Nguyen , Donald L. Humphrey , Susan M. Lewton
DOI: 10.1111/J.1151-2916.2003.TB03461.X
关键词: Oxygen 、 Water vapor 、 Weight change 、 Mineralogy 、 Chemistry 、 Combustion 、 Chemical kinetics 、 Silicon dioxide 、 Silicon nitride 、 Analytical chemistry 、 Volatilisation
摘要: Three Si 3 N 4 materials were exposed to dry oxygen flowing at 0.44 cm/s at temperatures between 1200 and 1400C. Weight change was measured using a continuously recording …
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