作者: A. I. Maksimov , A. V. Khlyustova
DOI: 10.1134/S0018143909030011
关键词: Chemical process 、 Metal 、 Glow discharge 、 Plasma 、 Chemical physics 、 Atomic emission spectroscopy 、 Atomic physics 、 Non-equilibrium thermodynamics 、 Emission intensity 、 Chemistry 、 Vaporization
摘要: The basic physical, physicochemical, and chemical processes occurring in the plasma-solution systems are considered. Data on correlation between emission intensity of electrolyte-cathode glow discharge rate nonequilibrium discharge-induced vaporization solution presented. A mechanism for appearance atomic threshold metal atoms plasma zone is proposed. role chemically active species generated by ion bombardment solutions shown.