作者: A. Lozano-Morales , J. Fitzgerald , V. Singh , X. Xie , E. J. Podlaha
DOI: 10.1149/1.2207840
关键词: Thin film 、 Partial current 、 Electrolyte 、 Reaction rate 、 Composite number 、 Metallurgy 、 Electrode 、 Chemical engineering 、 Nanocomposite 、 Rotating disk electrode 、 Materials science
摘要: The electrodeposition of Cu-γ-Al 2 O 3 nanocomposites as thin films and into recessed electrodes prepared with X-ray lithography was examined in ammonia-citrate electrolytes. Partial current density, efficiency deposit particle concentration were determined a rotating disk electrode. At pH 8 the presence particles resulted an enhancement Cu reaction rate, while at 10 rate appeared inhibited. amount larger for than 10, rendering solution more promising electrolyte to electrodeposit 500 μm deep recesses MEMS composite components.