Silicon Carbide (SIC) - Recent Results in Physics and in Technology

作者: Gerhard Pensl , Reinhard Helbig

DOI: 10.1007/BFB0108286

关键词: Engineering physicsMaterials scienceWide-bandgap semiconductorFabricationSilicon carbide

摘要: Silicon carbide provides promising physical properties which urge this wide band gap semiconductor to be reinspected as material for a possible use in highpower, high-speed, high-temperature, and high-radiation resistant devices. This demand second look is supported by progress the understanding of properties, recent improvement crystalline quality bulk epitaxially-grown films, development suitable process technologies necessary device fabrication. A brief review results on topics mentioned above given present paper.

参考文章(72)
Robert C. Marshall, GROWTH OF SILICON CARBIDE FROM SOLUTION Silicon Carbide–1968#R##N#Proceedings of the International Conference on Silicon Carbide, University Park, Pennsylvania, October 20–23, 1968. ,(1969) , 10.1016/B978-0-08-006768-1.50012-7
Y. M. Tairov, Y. A. Vodakov, Group IV materials (mainly SiC) Electroluminescence. ,vol. 17, pp. 31- 61 ,(1977) , 10.1007/3540081275_2
Michael Shur, GaAs devices and circuits ,(1987)
D. W. Feldman, James H. Parker, W. J. Choyke, Lyle Patrick, Phonon Dispersion Curves by Raman Scattering in SiC, Polytypes 3 C , 4 H , 6 H , 1 5 R , and 2 1 R Physical Review. ,vol. 173, pp. 787- 793 ,(1968) , 10.1103/PHYSREV.173.787
L. Muehlhoff, M. J. Bozack, W. J. Choyke, John T. Yates, Comparative oxidation studies of SiC(0001̄) and SiC(0001) surfaces Journal of Applied Physics. ,vol. 60, pp. 2558- 2563 ,(1986) , 10.1063/1.337121
R. Kaplan, R.J. Wagner, H.J. Kim, R.F. Davis, Electron cyclotron resonance in cubic SiC Solid State Communications. ,vol. 55, pp. 67- 69 ,(1985) , 10.1016/0038-1098(85)91107-X
K. Shibahara, S. Nishino, H. Matsunami, Antiphase-domain-free growth of cubic SiC on Si(100) Applied Physics Letters. ,vol. 50, pp. 1888- 1890 ,(1987) , 10.1063/1.97676
R. I. Scace, G. A. Slack, Solubility of Carbon in Silicon and Germanium The Journal of Chemical Physics. ,vol. 30, pp. 1551- 1555 ,(1959) , 10.1063/1.1730236
C. Wang, J. Bernholc, R. F. Davis, Formation energies, abundances, and the electronic structure of native defects in cubic SiC Physical Review B. ,vol. 38, pp. 12752- 12755 ,(1988) , 10.1103/PHYSREVB.38.12752
H. S. Kong, J. T. Glass, R. F. Davis, Chemical vapor deposition and characterization of 6H‐SiC thin films on off‐axis 6H‐SiC substrates Journal of Applied Physics. ,vol. 64, pp. 2672- 2679 ,(1988) , 10.1063/1.341608