Intermediate band materials obtained by rapid thermal process of Co-implanted silicon

作者: Jiren Yuan , Haibin Huang , Xinhua Deng , Mingang Gong , Cuicui Liu

DOI: 10.1016/J.MATLET.2017.08.095

关键词: Materials sciencePhase (matter)SiliconLayer (electronics)Analytical chemistrySolar cellIon implantationThermalImpuritySemiconductor

摘要: Abstract The intermediate band solar cell (IBSC) is a kind of novel photovoltaic device with very high efficiency limit. (IB) material key factor for fabricating high-performance IBSC. We explore to prepare IB by Co implantation in silicon followed rapid thermal process (RTP). results show that an successfully formed Si layer. located at about 0.3 eV above the valence edge. Moreover, no impurity phase samples. Our indicated it effective form materials combination ion and RTP method. This approach attractive since technique beneficial fabricate thick layers convenient use mass production.

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