Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas

作者: Yicheng Wang , R. J. Van Brunt , J. K. Olthoff

DOI: 10.1063/1.366741

关键词: Dissociation (chemistry)Mass spectrumArgonPlasmaMass spectrometryIonSulfur hexafluorideAnalytical chemistryChemistryOxygen

摘要: The dissociation fraction of molecules in radio frequency, planar, inductively coupled plasmas are measured for mixtures oxygen, nitrogen, sulfur hexafluoride, and chlorine argon. A modified gaseous electronics conference rf reference cell with an source is used to produce the discharges, pressures ranging from 1.3 Pa 5.3 applied powers 100 W 300 W. Neutrals sampled side discharge, degree determined mass spectrometrically by comparison intensities parent ion peaks plasma power on off. Measured levels O2 Ar:O2 ranged 0.02 (i.e., 2% oxygen were dissociated) 0.08 (8%), while Ar:SF6 0.92 0.98, depending upon conditions. Cl2 Ar:Cl2 near 0.07 0.19, N2 Ar:N2 less than all plasm...

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