Polarimetric characterization of bismuth thin films deposited by laser ablation.

作者: Rafael Espinosa-Luna , Enrique Camps , Dagoberto Cardona , Elder De la Rosa

DOI: 10.1364/AO.51.008549

关键词: BismuthLaser ablationPolarization (waves)OpticsRefractive indexLaserMaterials sciencePolarimeterThin filmMueller calculus

摘要: A Mueller-Stokes analysis is applied to pure bismuth thin film samples prepared by the laser ablation technique using a polarimeter with 632.8 nm continuum wavelength laser. The complex refractive index determined in range of 250-1100 nm. Results from Mueller matrix show high sensitivity diattenuation and polarizance parameters as function sample thickness incidence angle, except at pseudo-Brewster where they exhibit same value. that knowledge polarimetric response, appropriate incident polarization states, could be used design photonic Bi-based devices for several applications. Polarization dependence result changes on surface morphology small value skin depth.

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